Effects of Processing Conditions on the Work Function and Energy-Level Alignment of NiO Thin Films
Author:
Affiliation:
1. Department of Materials Science and Engineering, University of Toronto, 184 College Street, Toronto, Ontario, Canada M5S 3E4, and Department of Physics, Yunnan University, 2 Cuihu Beilu, Yunnan, Kunming 650091, People’s Republic of China
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp108281m
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