Chemical vapor deposition of platinum: new precursors and their properties-Reference-Cited by-同舟云学术

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Chemical vapor deposition of platinum: new precursors and their properties

Published:1991-07-01 Issue:4 Volume:3 Page:677-685
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Dryden Neil H.,Kumar Ravi,Ou Eric,Rashidi Mehdi,Roy Sujit,Norton Peter R.,Puddephatt Richard J.,Scott John D.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00016a022

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