Engineering Silk Protein to Modulate Polymorphic Transitions for Green Lithography Resists

Author:

Chung Soon-Chun1,Park Joon-Song1,Jha Rakesh Kumar2,Kim Jieun1,Kim Jinha1,Kim Muyoung3ORCID,Choi Juwan2,Kim Hongdeok4,Park Da-Hye1,Gogurla Narendar5,Lee Tae-Yun6,Jeon Heonsu6ORCID,Park Ji-Yong5ORCID,Choi Joonmyung4ORCID,Kim Ginam1,Kim Sunghwan27ORCID

Affiliation:

1. Material Research Center, Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., Suwon 16678, Korea

2. Department of Electronic Engineering, Hanyang University, Seoul 04763, Korea

3. Department of Plasma Engineering, Korea Institute of Machinery and Materials, Daejeon 34103, Korea

4. Department of Mechanical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan 15588, Korea

5. Department of Energy Systems Research, Ajou University, Suwon 16499, Korea

6. Department of Physics and Astronomy, Seoul National University, Seoul 08826, Korea

7. Department of Biomedical Engineering, Hanyang University, Seoul 04763, Korea

Funder

Samsung Advanced Institute of Technology

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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