Thermal Stability of the Ferroelectric Properties in 100 nm-Thick Al0.72Sc0.28N
Author:
Affiliation:
1. Namlab gGmbH, Nöthnitzer Strasse 64a, 01187Dresden, Germany
2. Technical Faculty, Kiel University, Kaiserstraße 2, 24143Kiel, Germany
3. Chair of Nanoelectronics, TU Dresden, 01187Dresden, Germany
Funder
Deutsche Forschungsgemeinschaft
Saxon State Parliament
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.2c18313
Reference67 articles.
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2. A 28 nm Embedded Split-Gate MONOS (SG-MONOS) Flash Macro for Automotive Achieving 6.4 GB/s Read Throughput by 200 MHz No-Wait Read Operation and 2.0 MB/s Write Throughput at Tj of 170C
3. Prolonged silicon carbide integrated circuit operation in Venus surface atmospheric conditions
4. High temperature electronics using SiC: actual situation and unsolved problems
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