Diffused Beam Energy to Dope van der Waals Electronics and Boost Their Contact Barrier Lowering

Author:

Lin Che-Yi12,Lee Mu-Pai3,Chang Yuan-Ming12ORCID,Tseng Yi-Tang3,Yang Feng-Shou4,Li Mengjiao12,Chen Jiann-Yeu56,Chen Ciao-Fen7,Tsai Meng-Yu4,Lin Yi-Chun8,Ueno Keiji9,Yamamoto Mahito10ORCID,Lo Shun-Tsung7,Lien Chen-Hsin4,Chiu Po-Wen4ORCID,Tsukagoshi Kazuhito11ORCID,Wu Wen-Wei3ORCID,Lin Yen-Fu125ORCID

Affiliation:

1. Department of Physics, National Chung Hsing University, Taichung 40227, Taiwan

2. Institute of Nanoscience, National Chung Hsing University, Taichung 40227, Taiwan

3. Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan

4. Institute of Electronic Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan

5. Department of Material Science and Engineering and i-Center for Advanced Science and Technology (i-CAST), National Chung Hsing University, Taichung 40227, Taiwan

6. Innovation and Development Center of Sustainable Agriculture, National Chung Hsing University, Taichung 40227, Taiwan

7. Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan

8. Instrument Center, National Chung Hsing University, Taichung 40227, Taiwan

9. Department of Chemistry, Graduate School of Science and Engineering, Saitama University, Saitama 338-8570, Japan

10. Department of Pure and Applied Physics, Kansai University, Osaka 564-8680, Japan

11. International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0044, Ibaraki, Japan

Funder

Ministry of Education

Ministry of Science and Technology, Taiwan

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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