Atomic and Electronic Structure of the Al<sub>2</sub>O<sub>3</sub>/Al Interface during Oxide Propagation Probed by Ab Initio Grand Canonical Monte Carlo-Reference-Cited by-同舟云学术

Atomic and Electronic Structure of the Al₂O₃/Al Interface during Oxide Propagation Probed by Ab Initio Grand Canonical Monte Carlo

Published:2022-09-09 Issue:37 Volume:14 Page:42613-42627
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Somjit Vrindaa¹^ORCID,Yildiz Bilge¹²^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States

2. Department of Nuclear Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States

Funder

Massachusetts Institute of Technology

Exelon Corporation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.2c08706

Reference76 articles.

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2. Microstructure and mechanical properties of Al2O3–Al composite coatings deposited by plasma spraying

3. Materials challenges and opportunities for quantum computing hardware

4. Fermi level pinning in metal/Al2O3/InGaAs gate stack after post metallization annealing

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