Nanomechanical Thermal Analysis of Photosensitive Polymers
Author:
Affiliation:
1. Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, Korea
2. Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB T6G 2M7, Canada
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma202194e
Reference30 articles.
1. Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214™
2. Thermal analysis of photoresists in aid of lithographic process development
3. Minteer, S. D.Microfluidic Techniques: Reviews and Protocols, SpringerLink, 2006; Vol.321, Part 2, p5.
4. Thermal analysis of photocurable materials
5. Determining the Young's modulus of SU-8 negative photoresist through tensile testing for MEMS applications
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