Author:
Appelt B. K.,Abadie M. J. M.
Subject
Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry
Reference12 articles.
1. Characterizing photoresists by thermal analysis
2. Kodak Publication No. Z-22-Ed: Basic Photographic Sensitometry Workbook.
3. ACS Symposium;Moore,1976
Cited by
16 articles.
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