Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors-Reference-Cited by-同舟云学术

Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors

Published:2024-04-05 Issue:15 Volume:146 Page:10708-10715
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Green Philippe B.¹^ORCID,Segura Lecina Ona¹,Albertini Petru P.¹,Newton Mark A.¹^ORCID,Kumar Krishna¹,Boulanger Coline¹,Leemans Jari¹^ORCID,Thompson Paul B.J.²,Loiudice Anna¹,Buonsanti Raffaella¹^ORCID

Affiliation:

1. Laboratory of Nanochemistry for Energy (LNCE), Institute of Chemical Sciences and Engineering (ISIC), École Polytechnique Fédérale de Lausanne, Sion CH-1950, Switzerland

2. XMaS beamline, United Kingdom CRG, European Synchrotron Radiation Facility, 71, avenue des Martyrs, CS 40220, Grenoble Cedex 9 38043, France

Funder

Schweizerischer Nationalfonds zur F?rderung der Wissenschaftlichen Forschung

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/jacs.4c00538

Reference52 articles.

1. Atomic Layer Deposition: An Overview

2. A brief review of atomic layer deposition: from fundamentals to applications

3. Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

4. Catalyst Design with Atomic Layer Deposition

5. Solar conversion of CO2 to CO using Earth-abundant electrocatalysts prepared by atomic layer modification of CuO

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