Generally Applicable Self-Masked Dry Etching Technique for Nanotip Array Fabrication-Reference-Cited by-同舟云学术

Generally Applicable Self-Masked Dry Etching Technique for Nanotip Array Fabrication

Published:2004-02-21 Issue:3 Volume:4 Page:471-475
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Hsu Chih-Hsun¹,Lo Hung-Chun¹,Chen Chia-Fu¹,Wu Chien Ting¹,Hwang Jih-Shang¹,Das Debajyoti¹,Tsai Jeff¹,Chen Li-Chyong¹,Chen Kuei-Hsien¹

Affiliation:

1. Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, Institute of Atomic and Molecular Science, Academia Sinica, Taipei 106, Taiwan, Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan, and Institute of Optoelectronic Sciences, National Ocean University, Keelung 202, Taiwan

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl049925t

Reference36 articles.

1. Oxidation sharpening of silicon tips

2. Fabrication of sub-10nm Si-tip array coated with Si3N4 thin film for potential NSOM and liquid metal ion source applications

3. Carbon-nanotube tips for scanning probe microscopy: Preparation by a controlled process and observation of deoxyribonucleic acid

4. Tip-surface interactions in scanning tunneling microscopy

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