High-Gyrotropy Seedlayer-Free Ce:TbIG for Monolithic Laser-Matched SOI Optical Isolators-Reference-Cited by-同舟云学术

High-Gyrotropy Seedlayer-Free Ce:TbIG for Monolithic Laser-Matched SOI Optical Isolators

Author:

Srinivasan Karthik¹^ORCID,Zhang Cui²,Dulal Prabesh³,Radu Cosmin⁴,Gage Thomas E.³,Hutchings David C.²^ORCID,Stadler Bethanie J. H.¹³

Affiliation:

1. Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minnesota 55455, United States

2. James Watt School of Engineering, University of Glasgow, Glasgow G12 8LS, United Kingdom

3. Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455, United States

4. Lakeshore Cryotronics Inc., Westerville, Ohio 43082, United States

Funder

Engineering and Physical Sciences Research Council

China Scholarship Council

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Biotechnology,Electronic, Optical and Magnetic Materials

Link

Reference38 articles.

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