Surface-Anchored Metal–Organic Frameworks as Versatile Resists for Gas-Assisted E-Beam Lithography: Fabrication of Sub-10 Nanometer Structures-Reference-Cited by-同舟云学术

Surface-Anchored Metal–Organic Frameworks as Versatile Resists for Gas-Assisted E-Beam Lithography: Fabrication of Sub-10 Nanometer Structures

Published:2018-03-14 Issue:4 Volume:12 Page:3825-3835
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Drost Martin¹,Tu Fan¹,Berger Luisa¹,Preischl Christian¹,Zhou Wencai²,Gliemann Hartmut²,Wöll Christof²^ORCID,Marbach Hubertus¹^ORCID

Affiliation:

1. Physikalische Chemie II, FAU Erlangen-Nürnberg, Egerlandstrasse 3, 91058 Erlangen, Germany

2. Institut für Funktionelle Grenzflächen, Karlsruher Institut für Technologie (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Funder

Deutsche Forschungsgemeinschaft

European Cooperation in Science and Technology

China Scholarship Council

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.8b01071

Reference47 articles.

1. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

2. Spatial resolution limits in electron-beam-induced deposition

3. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition

4. Gas-assisted focused electron beam and ion beam processing and fabrication

5. Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

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