Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication-Reference-Cited by-同舟云学术

Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication

Published:2009-09-01 Issue:10 Volume:9 Page:3629-3634
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Schvartzman Mark¹,Wind Shalom J.¹

Affiliation:

1. Department of Chemical Engineering, Columbia University, 500 West 120th Street, New York, New York 10027, and Department of Applied Physics and Applied Mathematics, Columbia University, 1020 Schapiro CEPSR, 530 West 120th Street, MC 8903, New York, New York 10027

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl9018512

Reference23 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

3. Polymer Imprint Lithography with Molecular-Scale Resolution

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