Multiphoton-Excited Deep-Ultraviolet Photolithography for 3D Nanofabrication-Reference-Cited by-同舟云学术

Multiphoton-Excited Deep-Ultraviolet Photolithography for 3D Nanofabrication

Published:2020-10-16 Issue:11 Volume:3 Page:11434-11441
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Taguchi Atsushi¹^ORCID,Nakayama Atsushi¹²^ORCID,Oketani Ryosuke¹,Kawata Satoshi¹³^ORCID,Fujita Katsumasa¹²⁴^ORCID

Affiliation:

1. Department of Applied Physics, Osaka University, Suita, Osaka 565-0871, Japan

2. Advanced Photonics and Biosensing Open Innovation Laboratory, AIST-Osaka University, Suita, Osaka 565-0871, Japan

3. Serendip Research, Suita, Osaka 565-0871, Japan

4. Transdimensional Life Imaging Division, Institute for Open and Transdisciplinary Research Initiatives, Osaka University, Suita, Osaka 565-0871, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.0c02519

Reference44 articles.

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5. Finer features for functional microdevices

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