Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating
Author:
Affiliation:
1. Tokyo Electron U.S. Holdings, Inc., Austin, Texas 78741, United States
Funder
Semiconductor Research Corporation
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.9b05190
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