Low-Power, High-Performance, Non-volatile Inkjet-Printed HfO2-Based Resistive Random Access Memory: From Device to Nanoscale Characterization

Author:

Vescio Giovanni1ORCID,Martín Gemma1ORCID,Crespo-Yepes Albert2,Claramunt Sergi2,Alonso Daniel2,López-Vidrier Julian3,Estradé Sonia1,Porti Marc2,Rodríguez Rosana2,Peiró Francesca4,Cornet Albert1,Cirera Albert4,Nafría Montserrat2

Affiliation:

1. MIND, Electronic and Biomedical Engineering Department, Universitat de Barcelona, 08028 ,Barcelona Spain

2. Electronic Engineering Department, Universitat Autònoma de Barcelona, 08193 Barcelona, Spain

3. IMTEK, Faculty of Engineering, Albert-Ludwigs-Universität Freiburg, 79110 Freiburg, Germany

4. Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, 08028 Barcelona, Spain

Funder

European Regional Development Fund

Ministerio de Econom?a y Competitividad

Ministerio de Educaci?n, Cultura y Deporte

Generalitat de Catalunya

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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1. Single-crystalline HfO2 nanostructures with novel ferromagnetic properties;Materials Today Nano;2024-12

2. Printed Memristors: An Overview of Ink, Materials, Deposition Techniques, and Applications;Advanced Electronic Materials;2024-08-02

3. Neuromorphic Technology Insights in Spain;2024 IEEE 24th International Conference on Nanotechnology (NANO);2024-07-08

4. Printing flexible thin-film transistors;Applied Physics Reviews;2023-09-01

5. Effect of downsizing and metallization on switching performance of ultrathin hafnium oxide memory cells;Materials Science in Semiconductor Processing;2023-05

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