Effect of downsizing and metallization on switching performance of ultrathin hafnium oxide memory cells
Author:
Funder
European Commission
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference48 articles.
1. Resistance random access memory;Chang;Science Direct Material Today,2016
2. Endurance/retention trade off in HfOx and TaOx based RRAM;Azzaz,2016
3. Conductive filament structure in HfO2 resistive switching memory device;Privitera;Solid State Electron.,2015
4. Defect engineering:reduction effect of H impurities in HfO2 based resistive memories;Kim;Nanotechnology,2012
5. G. Niu at al. Material insights of HfO2 based integrated 1T1R resistive RAM devices processed by batch ALD, Sci. Rep. 6:28155 DOI: 10.1038/srep28155.
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1. A carbon electrode approach for TiO2-write-once-read-many resistive memories;Materials Science in Semiconductor Processing;2024-12
2. HfO2-Based RRAM with In Situ Conductive Channels Induced by Nanoparticles to Improve Stability;ACS Applied Electronic Materials;2023-12-27
3. Hfo2-Based Rram with In-Situ Conductive Channels Induced by Nanoparticles to Improve Stability;2023
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