Room-Temperature Patterning of Nanoscale MoS2 under an Electron Beam

Author:

Saifullah Mohammad S. M.1ORCID,Asbahi Mohamed1,Binti-Kamran Kiyani Maryam1,Liow Sing Shy1,Bin Dolmanan Surani1,Yong Anna Marie1,Ong Esther A. H.2,Ibn Saifullah Asadullah23,Tan Hui Ru1,Dwivedi Neeraj4ORCID,Dutta Tanmay5,Ganesan Ramakrishnan6ORCID,Valiyaveettil Suresh2ORCID,Chong Karen S. L.1,Tripathy Sudhiranjan1

Affiliation:

1. Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology, and Research), 2 Fusionopolis Way, #08-03 Innovis, Singapore 138634, Republic of Singapore

2. Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543, Republic of Singapore

3. Department of Electrical and Electronic Engineering, Imperial College, South Kensington Campus, London SW7 2AZ, United Kingdom

4. CSIR-Advanced Materials and Processes Research Institute, Habibganj Naka, Hoshangabad Road, Bhopal 462 026, Madhya Pradesh, India

5. Department of Electrical and Computer Engineering, National University of Singapore, 21 Lower Kent Ridge Road, Singapore 117576, Republic of Singapore

6. Department of Chemistry, Birla Institute of Technology & Science, Pilani—Hyderabad Campus, Jawahar Nagar, Kapra Mandal, Hyderabad 500 078, Telangana, India

Funder

Agency for Science, Technology and Research

National University of Singapore

Institute of Materials Research and Engineering

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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