Opening the Band Gap of Graphene via Fluorination for High-Performance Dual-Mode Photodetector Application
Author:
Affiliation:
1. School of Electronic Science and Applied Physics, Hefei University of Technology, Hefei, Anhui 230009, China
2. Department of Physics, South China University of Technology, Guangzhou 510640, Guangdong, China
Funder
Ministry of Science and Technology
National Natural Science Foundation of China
Key Laboratory of Advanced Functional Materials and Devices of the Anhui Province
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.9b04389
Reference49 articles.
1. Electric Field Effect in Atomically Thin Carbon Films
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5. Performance Improvement of Graphene/Silicon Photodetectors Using High Work Function Metal Nanoparticles with Plasma Effect
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