Synthesis of Aminosilane Chemical Vapor Deposition Precursors and Polycarbosilazanes through Manganese-Catalyzed Si–N Dehydrocoupling-Reference-Cited by-同舟云学术

Synthesis of Aminosilane Chemical Vapor Deposition Precursors and Polycarbosilazanes through Manganese-Catalyzed Si–N Dehydrocoupling

Published:2022-03-21 Issue:13 Volume:10 Page:4218-4226
ISSN:2168-0485
Container-title:ACS Sustainable Chemistry & Engineering
language:en
Short-container-title:ACS Sustainable Chem. Eng.

Author:

Nguyen Thao T.¹^ORCID,Mukhopadhyay Tufan K.¹,MacMillan Samantha N.²^ORCID,Janicke Michael T.³,Trovitch Ryan J.¹^ORCID

Affiliation:

1. School of Molecular Sciences and Biodesign Center for Sustainable Macromolecular Materials and Manufacturing, Arizona State University, Tempe, Arizona 85287, United States

2. Department of Chemistry and Chemical Biology, Baker Laboratory, Cornell University, Ithaca, New York 14853, United States

3. Chemistry Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States

Funder

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Renewable Energy, Sustainability and the Environment,General Chemical Engineering,Environmental Chemistry,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acssuschemeng.2c00008

Reference48 articles.

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5. Kaga, Y.; Kikuchi, H.; Imamura, H.; Watanabe, J. Silicon Nitride Substrate, A Manufacturing Method of the Silicon Nitride Substrate, A Silicon Nitride Wiring Board using the Silicon Nitride Substrate, and Semiconductor Module. U.S. Patent US 7,915,533 B2, 2011.

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