Revealing Antiferroelectric Switching and Ferroelectric Wakeup in Hafnia by Advanced Piezoresponse Force Microscopy
Author:
Affiliation:
1. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States
2. IMEC, Kapeldreef 75, B-3001 Heverlee, Leuven, Belgium
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.0c07809
Reference51 articles.
1. Ferroelectricity in hafnium oxide thin films
2. Ferroelectric thin films: Review of materials, properties, and applications
3. Müller, J.; Yurchuk, E.; Schlösser, T.; Paul, J.; Hoffmann, R.; Müller, S.; Martin, D.; Slesazeck, S.; Polakowski, P.; Sundqvist, J. In Ferroelectricity in Hfo 2 Enables Nonvolatile Data Storage in 28 Nm Hkmg, 2012 Symposium on VLSI Technology (VLSIT); IEEE, 2012; pp 25–26.
4. Dünkel, S.; Trentzsch, M.; Richter, R.; Moll, P.; Fuchs, C.; Gehring, O.; Majer, M.; Wittek, S.; Müller, B.; Melde, T. In A Fefet Based Super-Low-Power Ultra-Fast Embedded Nvm Technology for 22nm Fdsoi and Beyond, 2017 IEEE International Electron Devices Meeting (IEDM); IEEE, 2017; pp 19.7. 1–19.7. 4.
5. Florent, K.; Lavizzari, S.; Di Piazza, L.; Popovici, M.; Vecchio, E.; Potoms, G.; Groeseneken, G.; Van IHoudt, J. In First Demonstration of Vertically Stacked Ferroelectric Al Doped Hfo 2 Devices for Nand Applications, 2017 Symposium on VLSI Technology; IEEE, 2017; pp T158–T159.
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