Damage-Free Atomic Layer Etch of WSe2: A Platform for Fabricating Clean Two-Dimensional Devices-Reference-Cited by-同舟云学术

Damage-Free Atomic Layer Etch of WSe2: A Platform for Fabricating Clean Two-Dimensional Devices

Published:2020-12-22 Issue:1 Volume:13 Page:1930-1942
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Nipane Ankur¹^ORCID,Choi Min Sup²³^ORCID,Sebastian Punnu Jose¹,Yao Kaiyuan²,Borah Abhinandan¹,Deshmukh Prathmesh⁴,Jung Younghun²,Kim Bumho²,Rajendran Anjaly¹,Kwock Kevin W. C.¹,Zangiabadi Amirali⁵,Menon Vinod M.⁴^ORCID,Schuck P. James²^ORCID,Yoo Won Jong³^ORCID,Hone James²,Teherani James T.¹

Affiliation:

1. Department of Electrical Engineering, Columbia University, New York, New York 10027-6902, United States

2. Department of Mechanical Engineering, Columbia University, New York, New York 10027-6902, United States

3. SKKU Advanced Institute of Nano Technology, Sungkyunkwan University, Suwon, Gyeonggi-do 16419, Korea

4. Department of Physics, Graduate Center of the City University of New York, New York, New York 10031-9101, United States

5. Department of Applied Physics and Mathematics, Columbia University, New York, New York 10027-6902, United States

Funder

National Research Foundation of Korea

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c18390

Reference70 articles.

1. Layer-Number Dependent Optical Properties of 2D Materials and Their Application for Thickness Determination

2. Thickness-dependent in-plane thermal conductivity of suspended MoS2 grown by chemical vapor deposition

3. Atomic Layer Etching: Rethinking the Art of Etch

4. Etching Techniques in 2D Materials

5. Emerging nanofabrication and quantum confinement techniques for 2D materials beyond graphene

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