Abatement of Perfluorocompounds by Tandem Packed-Bed Plasmas for Semiconductor Manufacturing Processes
Author:
Affiliation:
1. Graduate Institute of Environmental Engineering, National Central University, Chung-Li 320, Taiwan
Publisher
American Chemical Society (ACS)
Subject
Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ie0402923
Reference36 articles.
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3. Nonthermal Plasma for Gaseous Pollution Control
4. Abatement of Sulfur Hexafluoride Emissions from the Semiconductor Manufacturing Process by Atmospheric-Pressure Plasmas
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