Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors. Mechanistic Studies of the Thermolysis of Pt[CH2CMe2CH2CH═CH2]2 in Solution and the Origin of Rapid Nucleation-Reference-Cited by-同舟云学术

Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors. Mechanistic Studies of the Thermolysis of Pt[CH2CMe2CH2CH═CH2]2 in Solution and the Origin of Rapid Nucleation

Published:2020-10-26 Issue:21 Volume:39 Page:3817-3829
ISSN:0276-7333
Container-title:Organometallics
language:en
Short-container-title:Organometallics

Author:

Liu Sumeng¹^ORCID,Zhang Zhejun²,Abelson John R.²,Girolami Gregory S.¹^ORCID

Affiliation:

1. School of Chemical Sciences, University of Illinois at Urbana−Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801, United States

2. Department of Materials Science and Engineering, University of Illinois at Urbana−Champaign, 1304 West Green Street, Urbana, Illinois 61801, United States

Funder

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.organomet.0c00542

Reference72 articles.

1. Chemical Vapor Deposition of Metals for Integrated Circuit Applications

2. Chemical vapor deposition of metals: Part 1. An overview of CVD processes

3. Why is coordination chemistry stretching the limits of micro-electronics technology?

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