Subvalent Iridium Precursors for Atom-Efficient Chemical Vapor Deposition of Ir and IrO2 Thin Films-Reference-Cited by-同舟云学术

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Subvalent Iridium Precursors for Atom-Efficient Chemical Vapor Deposition of Ir and IrO2 Thin Films

Published:2017-06-02 Issue:12 Volume:36 Page:2331-2337
ISSN:0276-7333
Container-title:Organometallics
language:en
Short-container-title:Organometallics

Author:

Jürgensen Lasse¹^ORCID,Frank Michael¹,Pyeon Myeongwhun¹,Czympiel Lisa¹,Mathur Sanjay¹^ORCID

Affiliation:

1. Institute of Inorganic Chemistry, University of Cologne Greinstrasse 6, D-50939 Cologne, Germany

Funder

European Commission

Universit?t zu K?ln

Deutsche Forschungsgemeinschaft

Ministerium f?r Innovation, Wissenschaft und Forschung des Landes Nordrhein-Westfalen

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.organomet.7b00275

Reference48 articles.

1. Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses

2. Application of Atomic Layer Deposition of Platinum to Solid Oxide Fuel Cells

3. A comprehensive review on PEM water electrolysis

4. Ultra-thin platinum catalytic electrodes fabricated by atomic layer deposition

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3. Recycling organoiridium waste to [(1,5-cyclooctadiene)IrCl]₂;Green Chemistry;2024

4. High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors;ACS Applied Materials & Interfaces;2022-11-09

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