Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated Chemical Vapor Deposition

Published:2019-10-25 Issue:12 Volume:1 Page:3304-3312
ISSN:2637-6105
Container-title:ACS Applied Polymer Materials
language:en
Short-container-title:ACS Appl. Polym. Mater.

Author:

Abessolo Ondo Dominique¹,Loyer François¹,Werner Florian²^ORCID,Leturcq Renaud¹^ORCID,Dale Phillip J.²,Boscher Nicolas D.¹^ORCID

Affiliation:

1. Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 41, rue du Brill, L-4422 Belvaux, Luxembourg

2. Physics and Materials Science Research Unit, University of Luxembourg, 41, rue du Brill, L-4422 Belvaux, Luxembourg

Funder

Fonds National de la Recherche Luxembourg

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry,Polymers and Plastics,Process Chemistry and Technology

Link

http://pubs.acs.org/doi/pdf/10.1021/acsapm.9b00759

Reference45 articles.

1. Low dielectric constant polymers for microelectronics

2. High-k Gate Dielectrics for Emerging Flexible and Stretchable Electronics

3. Low-Voltage Organic Field-Effect Transistors and Inverters Enabled by Ultrathin Cross-Linked Polymers as Gate Dielectrics

4. Flexible, Low-Power Thin-Film Transistors Made of Vapor-Phase Synthesized High-k, Ultrathin Polymer Gate Dielectrics

5. Synthesis of ultrathin polymer insulating layers by initiated chemical vapour deposition for low-power soft electronics

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