Nanoporous Silicon Dioxide Films for Large Area and Low-Cost Fabrication of Ultra-Low Refractive Index Coatings-Reference-Cited by-同舟云学术

Nanoporous Silicon Dioxide Films for Large Area and Low-Cost Fabrication of Ultra-Low Refractive Index Coatings

Published:2023-08-24 Issue:17 Volume:6 Page:15437-15444
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Wu Han¹²^ORCID,Liu Can¹²,Zhu Zeyu¹²,Shao Yu¹²,Lin Jie¹²,Wen Junren¹²^ORCID,Wang Hailan³^ORCID,Zhang Yueguang³,Liang Tao¹,Shao Yuchuan¹²^ORCID,Shen Weidong³^ORCID,Yang Chenying¹³^ORCID

Affiliation:

1. Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China

2. Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences, Shanghai 201800, China

3. State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.3c01963

Reference39 articles.

1. Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

2. Broadband Optical Antireflection Enhancement by Integrating Antireflective Nanoislands with Silicon Nanoconical-Frustum Arrays

3. Perovskite nanowire lasers on low-refractive-index conductive substrate for high-Q and low-threshold operation

4. Comparative study on cracking behavior of sol-gel silica antireflective coating for high-powered laser system

5. Lessons from nature: biomimetic subwavelength structures for high-performance optics

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