Circular Nanopatterns over Large Areas from the Self-Assembly of Block Copolymers Guided by Shallow Trenches-Reference-Cited by-同舟云学术

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Circular Nanopatterns over Large Areas from the Self-Assembly of Block Copolymers Guided by Shallow Trenches

Published:2011-03-11 Issue:4 Volume:5 Page:2855-2860
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Hong Sung Woo¹,Gu Xiaodan¹,Huh June²,Xiao Shuaigang³,Russell Thomas P.¹

Affiliation:

1. Department of Polymer Science and Engineering, University of Massachusetts, Amherst, Massachusetts 01003, United States

2. Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong, Seodaemun-gu, Seoul 120-749, Korea

3. Seagate Technology, 47010 Kato Road, Fremont, California 94538, United States.

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn103401w

Reference24 articles.

1. Patterned Media Towards Nano-bit Magnetic Recording: Fabrication and Challenges

2. Chou, S. Y.Nanoimprint Lithography.US 5772905, 1998.

3. Polymers on Nanoperiodic, Heterogeneous Surfaces

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