Sub-10-nm Wide Trench, Line, and Hole Fabrication Using Pressed Self-Perfection
Author:
Affiliation:
1. NanoStructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl801030c
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