Negative Resists Using Acid-Catalyzed Dehydration of Phenylcarbinols: Correlation between Chemical Structure and Resist Sensitivity
Author:
Affiliation:
1. Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm960133c
Reference11 articles.
1. Design of polymeric imaging materials based on electrophilic aromatic substitution: model studies
2. Novel chemically amplified dry-developing imaging materials for high resolution microlithography.
3. Photocrosslinking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities
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