Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography-Reference-Cited by-同舟云学术

Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Published:2018-05-03 Issue:6 Volume:303 Page:1700654
ISSN:1438-7492
Container-title:Macromolecular Materials and Engineering
language:en
Short-container-title:Macromol. Mater. Eng.

Author:

Peng Xiaoman¹,Wang Yafei¹,Xu Jian¹,Yuan Hua¹,Wang Liangqian¹,Zhang Tao¹,Guo Xudong¹,Wang Shuangqing¹^ORCID,Li Yi²^ORCID,Yang Guoqiang¹^ORCID

Affiliation:

1. Beijing National Laboratory for Molecular Sciences; Key Laboratory of Photochemistry; Institute of Chemistry; University of Chinese Academy of Sciences; Chinese Academy of Sciences; Beijing 100190 China

2. Key Laboratory of Photochemical Conversion and Optoelectronic Materials; Technical Institute of Physics and Chemistry; University of Chinese Academy of Sciences, Chinese Academy of Sciences; Beijing 100190 China

Funder

National Natural Science Foundation of China

National Science and Technology Major

Salt Science Research Foundation

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Organic Chemistry,General Chemical Engineering

Reference33 articles.

1. Progress in Piezotronics and Piezo-Phototronics

2. Fabrication of Transistors on Flexible Substrates: from Mass-Printing to High-Resolution Alternative Lithography Strategies

3. Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual-Beam Quadruple Exposure

4. Combination of Integrin-Binding Peptide and Growth Factor Promotes Cell Adhesion on Electron-Beam-Fabricated Patterns

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