Controlled Dopant Distribution and Higher Doping Efficiencies by Surface-Functionalized Atomic Layer Deposition
Author:
Affiliation:
1. Energy Systems Division, Argonne National Laboratory, 9700 South Cass Avenue, Argonne Illinois 60439, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm2014576
Reference19 articles.
1. Optical and electrical properties of doped In2O3 films
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5. In Situ Analysis of Dopant Incorporation, Activation, and Film Growth during Thin Film ZnO and ZnO:Al Atomic Layer Deposition
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