Enhancement of Acid Photogeneration Through a Para-to-Meta Substitution Strategy in a Sulfonium-Based Alkoxystilbene Designed for Two-Photon Polymerization-Reference-Cited by-同舟云学术

Enhancement of Acid Photogeneration Through a Para-to-Meta Substitution Strategy in a Sulfonium-Based Alkoxystilbene Designed for Two-Photon Polymerization

Published:2012-01-04 Issue:2 Volume:24 Page:237-244
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Xia Rongjie¹,Malval Jean-Pierre²,Jin Ming¹,Spangenberg Arnaud²,Wan Decheng¹,Pu Hongting¹,Vergote Thomas²³,Morlet-Savary Fabrice²,Chaumeil Hélène³,Baldeck Patrice⁴,Poizat Olivier⁵,Soppera Olivier²

Affiliation:

1. Institute of Functional Polymer Materials, Tongji University, 1239 Siping Road, 200092 Shanghai, China

2. Institut de Sciences des Matériaux de Mulhouse, LRC CNRS 7228, Université de Haute Alsace, 15 Rue Jean Starcky, 68057 Mulhouse, France

3. Laboratoire de Chimie Organique et Bioorganique EA 4566, Université de Haute Alsace, ENSCMu, 3 Rue Alfred Werner, 68093 Mulhouse, France

4. Laboratoire Interdisciplinaire de Physique, UMR CNRS 5588, Université Joseph Fourier, 38402 Saint Martin d’Hères, France

5. Laboratoire de Spectrochimie Infrarouge et Raman, UMR CNRS 8516, Université des Sciences et Technologies de Lille, 59655 Villeneuve d’Ascq Cedex, France

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm2030075

Reference57 articles.

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2. Reichmanis, E.; Houlihan, F. M.; Nalamasu, O.; Neenan, T. X.InPolymers for Microelectronics;American Chemical Society:Washington DC, 1993; Vol.537, pp2–24.

3. Photoacid and photobase generators: Chemistry and applications to polymeric materials

4. Advances in 3D nano/microfabrication using two-photon initiated polymerization

5. Recent developments in the use of two-photon polymerization in precise 2D and 3D microfabrications

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