Temperature-Dependent Order-to-Order Transition of Polystyrene-block-poly(ethylene-co-butylene)-block-polystyrene Triblock Copolymer under Multilayered Confinement
Author:
Affiliation:
1. The State Key Laboratory of Polymer Materials Engineering, Polymer Research Institute of Sichuan University, Chengdu, Sichuan 610065, China
Funder
National Natural Science Foundation of China
Sichuan Province
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.7b02651
Reference59 articles.
1. Block Copolymer Directed Nanostructured Surfaces as Templates for Confined Surface Reactions
2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
3. Branched Block Copolymers for Tuning of Morphology and Feature Size in Thin Film Nanolithography
4. Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication
5. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
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