Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features-Reference-Cited by-同舟云学术

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Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features

Published:2021-10-13 Issue:20 Volume:54 Page:9542-9550
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Sun Jian¹,Lee Changyeon²,Osuji Chinedum O.²^ORCID,Gopalan Padma¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, University of Wisconsin−Madison, Madison, Wisconsin 53706, United States

2. Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States

Funder

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.1c01611

Reference68 articles.

1. Block Copolymer Lithography

2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

3. Ultrahigh-density phase-change data storage without the use of heating

4. Block Copolymer Thin Films: Physics and Applications

5. Block copolymers and conventional lithography

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1. Hydrolysis-Induced Morphology Evolution of Linear and Bottlebrush Block Copolymers in Thin Films with Acid Vapor or Photoacid Generators;Macromolecules;2024-02-02

2. Supramolecular Self-Assembly of Diketopyrrolopyrrole with Unprecedented Photoconductivity;ACS Applied Electronic Materials;2023-08-25

3. Galactose-Based Block Copolymers with Switchable χ Parameters for Tuning Phase Separated Morphology;Macromolecules;2023-03-22

4. Morphology Control of Perpendicularly Oriented Lamellar Films from Azobenzene-Containing Block Copolymers with Different Spacer Lengths;The Journal of Physical Chemistry C;2023-02-10

5. Synthesis and Self-assembly of Silicon-containing Block Copolymers for Sub 5 nm Nanolithography;ACTA POLYM SIN;2022

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