Sequence-Defined Multiblock Copolymer Nanoengineered Particles from Polymerization-Induced Self-Assembly (PISA): Synthesis and Film Formation-Reference-Cited by-同舟云学术

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Sequence-Defined Multiblock Copolymer Nanoengineered Particles from Polymerization-Induced Self-Assembly (PISA): Synthesis and Film Formation

Published:2023-11-20 Issue:23 Volume:56 Page:9711-9724
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Thompson Steven W.¹,Guimarães Thiago R.²^ORCID,Zetterlund Per B.¹^ORCID

Affiliation:

1. Cluster for Advanced Macromolecular Design (CAMD), School of Chemical Engineering, The University of New South Wales, Sydney, NSW 2052, Australia

2. Laboratoire de Chimie des Polymères Organiques (LCPO-UMR 5629), Université de Bordeaux, Bordeaux INP, CNRS, F-33607 Pessac, France

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.3c01575

Reference99 articles.

1. High-Order Multiblock Copolymers via Iterative Cu(0)-Mediated Radical Polymerizations (SET-LRP): Toward Biological Precision

2. Synthetic approaches for multiblock copolymers

3. Sequence-Controlled Polymers

4. 50th Anniversary Perspective: Block Polymers—Pure Potential

5. Efficient multiblock star polymer synthesis from photo-induced copper-mediated polymerization with up to 21 arms

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