Methacrylic Block Copolymers Containing Liquid Crystalline and Fluorinated Side Chains Capable of Fast Formation of 4 nm Domains-Reference-Cited by-同舟云学术

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Methacrylic Block Copolymers Containing Liquid Crystalline and Fluorinated Side Chains Capable of Fast Formation of 4 nm Domains

Published:2020-10-06 Issue:20 Volume:53 Page:8757-8764
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Cao Hui¹,Dai Le¹,Liu Yuyun¹,Li Xuemiao¹^ORCID,Yang Zhenyu¹,Deng Hai¹^ORCID

Affiliation:

1. School of Microelectronics and State Key Laboratory of Molecular Engineering of Polymers, Fudan University, Shanghai 200433, China

Funder

Fudan University

Ministry of Science and Technology of the People's Republic of China

Science and Technology Commission of Shanghai Municipality

Laboratory of Advanced Materials, Fudan University

State Key Laboratory of Molecular Engineering of Polymers, Fudan University

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.0c00777

Reference45 articles.

1. International Technology Roadmap for Semiconductors (ITRS)—Lithography, 2015.

2. Recent progress in high resolution lithography

3. Extreme ultraviolet lithography: Status and prospects

4. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

5. Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains

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1. High χ P2PFBEMA-b-P2VP Block Copolymers Forming 6–8 nm Domains for Semiconductor Lithography;ACS Applied Materials & Interfaces;2024-06-05

2. Self-Assembly of Hierarchical High-χ Fluorinated Block Copolymers with an Orthogonal Smectic-within-Lamellae 3 nm Sublattice and Vertical Surface Orientation;ACS Nano;2024-04-16

3. Advanced Design of Block Copolymers for Nanolithography;PROG CHEM;2023

4. Synthesis and Self-Assembly of Silicon-Containing Azobenzene Liquid Crystalline Block Copolymers;Macromolecules;2023-01-10

5. Synthesis and Self-assembly of Silicon-containing Block Copolymers for Sub 5 nm Nanolithography;ACTA POLYM SIN;2022

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