Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity-Reference-Cited by-同舟云学术

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Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity

Published:2018-08-15 Issue:16 Volume:51 Page:6460-6467
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Azuma Koei¹,Sun Jian,Choo Youngwoo²,Rokhlenko Yekaterina²,Dwyer Jonathan H.,Schweitzer Beau,Hayakawa Teruaki¹^ORCID,Osuji Chinedum O.²^ORCID,Gopalan Padma^ORCID

Affiliation:

1. Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo 152-8552, Japan

2. Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06511, United States

Funder

Division of Electrical, Communications and Cyber Systems

Brookhaven National Laboratory

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.8b01409

Reference48 articles.

1. Inorganic block copolymer lithography

2. Block copolymer patterns and templates

3. Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

4. Interfacial Layers with Photoswitching Surface Energy for Block Copolymer Alignment and Directed Self-Assembly

5. Orienting Block Copolymer Thin Films via Entropy

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