Preferential Positioning of Dopants and Co-Dopants in Embedded and Freestanding Si Nanocrystals-Reference-Cited by-同舟云学术

Preferential Positioning of Dopants and Co-Dopants in Embedded and Freestanding Si Nanocrystals

Published:2014-03-04 Issue:11 Volume:136 Page:4404-4409
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Guerra Roberto¹,Ossicini Stefano²³

Affiliation:

1. International School for Advanced Studies (SISSA), via Bonomea 265, I-34136 Trieste, Italy

2. Centro Interdipartimentale En&Tech, Università degli Studi di Modena e Reggio Emilia, via Amendola 2 Pad. Morselli, 42122 Reggio Emilia, Italy

3. Dipartimento di Scienze e Metodi dell’Ingegneria, Università degli Studi di Modena e Reggio Emilia, via Amendola 2 Pad. Morselli, 42122 Reggio Emilia, Italy

Funder

European Commission

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja5002357

Reference44 articles.

1. Nanosilicon photonics

2. Si-nanocrystal-based LEDs fabricated by ion implantation and plasma-enhanced chemical vapour deposition

3. High-Efficiency Silicon Nanocrystal Light-Emitting Devices

4. Size-Dependent Absolute Quantum Yields for Size-Separated Colloidally-Stable Silicon Nanocrystals

5. Silicon nanocrystals in an oxide matrix for thin film solar cells with 492mV open circuit voltage

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