Si-nanocrystal-based LEDs fabricated by ion implantation and plasma-enhanced chemical vapour deposition-Reference-Cited by-同舟云学术

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Si-nanocrystal-based LEDs fabricated by ion implantation and plasma-enhanced chemical vapour deposition

Published:2009-09-08 Issue:40 Volume:20 Page:405201
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Perálvarez M,Barreto J,Carreras Josep,Morales A,Navarro-Urrios D,Lebour Y,Domínguez C,Garrido B

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/20/i=40/a=405201/pdf

Reference24 articles.

1. Direct modulation of electroluminescence from silicon nanocrystals beyond radiative recombination rates

2. Design of a nanoscale silicon laser

3. Silicon Photonics

4. A continuous-wave Raman silicon laser

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