Effects of the Ion to Growth Flux Ratio on the Constitution and Mechanical Properties of Cr1–x-Alx-N Thin Films-Reference-Cited by-同舟云学术

Effects of the Ion to Growth Flux Ratio on the Constitution and Mechanical Properties of Cr1–x-Alx-N Thin Films

Published:2019-11-05 Issue:12 Volume:21 Page:782-793
ISSN:2156-8952
Container-title:ACS Combinatorial Science
language:en
Short-container-title:ACS Comb. Sci.

Author:

Banko Lars,Ries Stefan,Grochla Dario,Arghavani Mostafa¹,Salomon Steffen,Pfetzing-Micklich Janine,Kostka Aleksander,Rogalla Detlef²,Schulze Julian,Awakowicz Peter,Ludwig Alfred^ORCID

Affiliation:

1. Surface Engineering Institute, RWTH Aachen University, Kackertstrasse 15, 52072 Aachen, Germany

2. RUBION, Ruhr-Universität Bochum, 44801 Bochum, Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

American Chemical Society (ACS)

Subject

General Chemistry,General Medicine

Link

https://pubs.acs.org/doi/pdf/10.1021/acscombsci.9b00123

Reference51 articles.

1. Average energy deposited per atom: A universal parameter for describing ion‐assisted film growth?

2. Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

3. Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN

4. A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering

5. CrN/AlN nanolaminate coatings deposited via high power pulsed and middle frequency pulsed magnetron sputtering

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