Relaxation Behavior of Polymer Structures Fabricated by Nanoimprint Lithography-Reference-Cited by-同舟云学术

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Relaxation Behavior of Polymer Structures Fabricated by Nanoimprint Lithography

Published:2007-08-14 Issue:2 Volume:1 Page:84-92
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Ding Yifu¹,Ro Hyun Wook¹,Germer Thomas A.²,Douglas Jack F.¹,Okerberg Brian C.¹,Karim Alamgir¹,Soles Christopher L.¹

Affiliation:

1. Polymers Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899-8541

2. Optical Technology Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899-8443

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn700014p

Reference63 articles.

1. Imprint lithography for integrated circuit fabrication

2. Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology.

3. Step and flash imprint lithography: Template surface treatment and defect analysis

4. Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography

5. Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography

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1. Modeling and process simulation;Hot Embossing;2024

2. Nanoimprint Lithography;Nanofabrication;2024

3. Polymer Nanocomposite Dielectrics: Understanding the Matrix/Particle Interface;ACS Nano;2022-09-15

4. Dynamics of Confined Microgel Liquids: Weakened Spatial Confinement Effect by Microgel Particle Compliance;Langmuir;2021-04-22

5. Observation of General Entropy–Enthalpy Compensation Effect in the Relaxation of Wrinkled Polymer Nanocomposite Films;Nano Letters;2021-02-01

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