Atomic Layer Deposition of Ru/RuO2 Thin Films Studied by In situ Infrared Spectroscopy-Reference-Cited by-同舟云学术

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Atomic Layer Deposition of Ru/RuO2 Thin Films Studied by In situ Infrared Spectroscopy

Published:2010-08-11 Issue:17 Volume:22 Page:4867-4878
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Park S. K.¹,Kanjolia R.²,Anthis J.²,Odedra R.²,Boag N.³,Wielunski L.⁴,Chabal Y. J.¹

Affiliation:

1. Materials Science and Engineering Department, University of Texas at Dallas, Richardson, Texas 75080

2. SAFC Hitech, Haverhill, Massachusetts 01832

3. Functional Materials, Institute for Materials Research, University of Salford, Manchester M5 4WT, United Kingdom

4. Department of Physics and Astronomy, Rutgers University, Piscataway, New Jersey 08854

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm903793u

Reference56 articles.

1. Chemical Vapor Deposition of Ru and RuO2 for Gate Electrode Applications

2. Ruthenium Thin Films Grown by Atomic Layer Deposition

3. Thermally Unstable Ruthenium Oxide Gate Electrodes in Metal/High-kGate Stacks

4. PEALD of a Ruthenium Adhesion Layer for Copper Interconnects

5. Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layer

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3. MOF-derived ultrasmall Ru@RuO2 heterostructures as bifunctional and pH-universal electrocatalysts for 0.79 V asymmetric amphoteric overall water splitting;Chemical Engineering Journal;2023-03

4. Role of dose optimization in Ru atomic layer deposition for low resistivity films;Journal of Vacuum Science & Technology B;2023-01

5. Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research;Review of Scientific Instruments;2022-01-01

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