A Model for Drying Control Cosolvent Selection for Spin-Coating Uniformity: The Thin Film Limit
Author:
Affiliation:
1. Department of Materials Science and Engineering, Rutgers University, Piscataway, New Jersey 08854-8065, United States
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la401106z
Reference60 articles.
1. Surface Tension Effects In Microlithography - Striations
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