Chemical Modification of Self-Assembled Monolayers by Exposure to Soft X-rays in Air
Author:
Affiliation:
1. Department of Chemical Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp000145s
Reference25 articles.
1. The structure of self-assembled monolayers of alkylsiloxanes on silicon: a comparison of results from ellipsometry and low-angle x-ray reflectivity
2. X-ray Damage to CF 3 CO 2 -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons
3. Damage to trifluoroacetamido-terminated organic self-assembled monolayers (SAMs) on aluminum, titanium, copper and gold by aluminum K.alpha. x-rays is due principally to electrons
4. Monolayer Damage in XPS Measurements As Evaluated by Independent Methods
5. Selective Cleavage of the Nitro Group from a Nitrophenyl Monolayer by Synchrotron Soft X-ray
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