Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly-Reference-Cited by-同舟云学术

Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly

Published:2018-07-11 Issue:1 Volume:8 Page:
ISSN:2045-2322
Container-title:Scientific Reports
language:en
Short-container-title:Sci Rep

Author:

Leuschel Benjamin,Gwiazda Agnieszka,Heni Wajdi,Diot Frédéric,Yu Shang-Yu,Bidaud Clémentine,Vonna Laurent,Ponche Arnaud,Haidara Hamidou,Soppera Olivier

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Link

http://www.nature.com/articles/s41598-018-28196-1.pdf

Reference62 articles.

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3. Moore, G. E. Cramming more components onto integrated circuits. Electronics, 114–117, April 19 (1965).

4. Chen, Y. F. Nanofabrication by electron beam lithography and its applications: A review. Microelectron. Eng. 135, 57–72 (2015).

5. Maldonado, J. R. & Peckerar, M. X-ray lithography: Some history, current status and future prospects. Microelectron. Eng. 161, 87–93 (2016).

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