Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide-Reference-Cited by-同舟云学术

Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide

Published:2001-10-30 Issue:24 Volume:40 Page:5858-5860
ISSN:0888-5885
Container-title:Industrial & Engineering Chemistry Research
language:en
Short-container-title:Ind. Eng. Chem. Res.

Author:

Jincao Ye¹,Matthews Michael A.¹,Darvin Charles H.²

Affiliation:

1. Department of Chemical Engineering, University of South Carolina, 300 Main Street, Columbia, South Carolina 29208

2. Office of Research and Development, Air Pollution Prevention and Control Division, U.S. Environmental Protection Agency, Research Triangle Park, North Carolina 27711

Publisher

American Chemical Society (ACS)

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ie010424h

Reference7 articles.

1. Prevention of Resist Pattern Collapse by Resist Heating during Rinsing

2. Mechanism of Resist Pattern Collapse

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