Controlled Patterning of Plasmonic Dimers by Using an Ultrathin Nanoporous Alumina Membrane as a Shadow Mask-Reference-Cited by-同舟云学术

Controlled Patterning of Plasmonic Dimers by Using an Ultrathin Nanoporous Alumina Membrane as a Shadow Mask

Author:

Hao Qi¹²^ORCID,Huang Hao²³,Fan Xingce³,Yin Yin¹⁴^ORCID,Wang Jiawei¹,Li Wan²,Qiu Teng³^ORCID,Ma Libo¹^ORCID,Chu Paul K.²,Schmidt Oliver G.¹⁴

Affiliation:

1. Institute for Integrative Nanosciences, Leibniz IFW Dresden, Helmholtzstraße 20, 01069 Dresden, Germany

2. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong 999077, China

3. Department of Physics, Southeast University, Nanjing 211189, P. R. China

4. Material Systems for Nanoelectronics, Chemnitz University of Technology, Reichenhainer Str. 70, 09107 Chemnitz, Germany

Funder

Research Grants Council, University Grants Committee

Ministry of Science and Technology of the People's Republic of China

Deutsche Forschungsgemeinschaft

City University of Hong Kong

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

Reference67 articles.

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