Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO2-Reference-Cited by-同舟云学术

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Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO2

Published:2017-08-28 Issue:36 Volume:9 Page:31067-31075
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Gasvoda Ryan J.¹^ORCID,van de Steeg Alex W.²,Bhowmick Ranadeep³,Hudson Eric A.³,Agarwal Sumit¹

Affiliation:

1. Department of Chemical and Biological Engineering, Colorado School of Mines, 1613 Illinois Street, Golden, Colorado 80401, United States

2. Applied Physics Department, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

3. Lam Research Corporation, 4650 Cushing Parkway, Fremont, California 94538, United States

Funder

Lam Research Foundation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.7b08234

Reference52 articles.

1. Plasma etching: Yesterday, today, and tomorrow

2. Perspectives in nanoscale plasma etching: what are the ultimate limits?

3. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

4. Overview of atomic layer etching in the semiconductor industry

5. Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?

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1. Improving SiO2 to SiNx etch selectivity during atomic layer etching with multiple selective organic pre-functionalization steps;Journal of Vacuum Science & Technology A;2024-04-26

2. In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching;Journal of Vacuum Science & Technology A;2024-04-26

3. Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6);Journal of Vacuum Science & Technology A;2024-04-16

4. An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching;Journal of Vacuum Science & Technology A;2024-02-12

5. Layer-by-layer thinning of two-dimensional materials;Chemical Society Reviews;2024

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