Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO

Author:

Garg Vivek1ORCID,Sengar Brajendra S.1,Awasthi Vishnu1,Kumar Amitesh1ORCID,Singh Rohit1ORCID,Kumar Shailendra2,Mukherjee C.34,Atuchin V. V.567ORCID,Mukherjee Shaibal1ORCID

Affiliation:

1. Hybrid Nanodevice Research Group (HNRG), Electrical Engineering, Indian Institute of Technology (IIT) Indore, Indore 453552, Madhya Pradesh, India

2. Raja Ramanna Center for Advanced Technology, Indore 452013, India

3. Advanced Laser and Optics Division, Raja Ramanna Center for Advanced Technology, Indore 452013, India

4. Homi Bhabha National Institute, Training School Complex, Anushakti Nagar, Mumbai 400094, India

5. Laboratory of Optical Materials and Structures, Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090, Russia

6. Functional Electronics Laboratory, Tomsk State University, Tomsk 634050, Russia

7. Laboratory of Single Crystal Growth, South Ural State University, Chelyabinsk 454080, Russia

Funder

Council of Scientific and Industrial Research

University Grants Commission

Ministry of Electronics and Information technology

Board of Research in Nuclear Sciences

Russian Foundation for Basic Research

Department of Science and Technology, Ministry of Science and Technology

Tomsk State University

Ministry of Education and Science of the Russian Federation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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